Temperature control for performing heat process in...

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Reexamination Certificate

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C219S444100

Reexamination Certificate

active

07868270

ABSTRACT:
A temperature control method is used for controlling a temperature of a hot plate, so that a measured temperature of the hot plate conforms to a target temperature thereof, in a heat processing apparatus for performing a heat process on a substrate placed on the hot plate, which is used in a coating/developing system for applying a resist coating onto the substrate to form a resist film and then performing development on the resist film after light exposure. The method includes acquiring adjustment data necessary for adjusting a reaching time defined by a time period for increasing the temperature of the substrate from a first temperature around an initial temperature to a second temperature around the target temperature; and adjusting the target temperature by use of the adjustment data thus acquired, after starting the process on the substrate.

REFERENCES:
patent: 7536230 (2009-05-01), Nanno et al.
patent: 11-67619 (1999-03-01), None
patent: 2001-230199 (2001-08-01), None
patent: 2003-142386 (2003-05-01), None
patent: 2005-33178 (2005-02-01), None
patent: 2007-11982 (2007-01-01), None
patent: 2007-79897 (2007-03-01), None

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