Temperature control apparatus for thin film deposition system

Details Temperature control apparatus for thin film deposition system Temperature control apparatus for thin film deposition system

1987-12-14

1989-03-14

Bueker, Richard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118725, 118730, 204298, C23C 1400

Patent

active

048116874

ABSTRACT:
Apparatus adapted for use in high vacuum, thin-film deposition system for controlling the temperature of moving substrate holder. Preferably, such temperature control apparatus comprises a fixed, temperature-controlled, thermally conductive member, and liquid heat transfer medium (preferably liquid gallium) for thermally coupling such member to the substrate holder as it moves through a vacuum chamber.

REFERENCES:
patent: 4100879 (1978-07-01), Goldin
patent: 4171235 (1979-10-01), Fraas
patent: 4226208 (1980-10-01), Nishida
patent: 4632058 (1986-12-01), Dixon

Affiliated with

Also associated with

Rating

Temperature control apparatus for thin film deposition system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Temperature control apparatus for thin film deposition system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Temperature control apparatus for thin film deposition system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-888073