Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-01-09
1998-05-26
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419212, 20429809, C23C 1434
Patent
active
057559368
ABSTRACT:
In a thin film process system, an anti-contamination device, anti-flake shield or collimator plate, is fit to a process chamber. By maintaining a temperature differential between the chamber body and the device, or between the device and any adapter used to conform the device to the chamber apparatus, the device expands to maintain a substantially sealing press fit to the chamber body. The temperature differential can be maintained even when the process is finished until it is time to remove the device for cleaning or disposal and replacement.
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patent: 5240580 (1993-08-01), Henderson et al.
patent: 5254236 (1993-10-01), Kinokiri et al.
Applied Materials Inc
Morris Birgit E.
Nguyen Nam
Verplancken Donald
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