Temperature actuated siphon system

Fluid handling – Siphons – Periodic or accumulation responsive discharge

Patent

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Details

137140, 137142, 137151, F04F 1000

Patent

active

041687175

ABSTRACT:
A siphon system in which an enclosed container has a chamber for heating a gaseous fluid as by solar radiation. The chamber is in continuous open communication with a siphon having an inlet at an upper level and an outlet at a lower level. A pressure responsive valve is located at the outlet for permitting the release of gaseous fluid at pressures over atmosphere and closing the outlet to communicate pressures below atmosphere to the inlet to start the siphon. When the siphon is filled, the pressure responsive valve opens to release the liquid from the outlet. A float valve may be used at the inlet to retain a below atmospheric pressure in the system for immediate operation when the liquid accumulates at the inlet.

REFERENCES:
patent: 301391 (1884-07-01), Reinecke
patent: 2313855 (1943-03-01), Wiggins
patent: 4059126 (1977-11-01), Nickerson

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