Telechelic vinyl resin of low molecular weight having alkoxysily

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...

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522 54, 522182, C08F 400, C08F 246

Patent

active

049181149

DESCRIPTION:

BRIEF SUMMARY
TECHNICAL FIELD

The present invention relates to telechelic vinyl resin of a low molecular weight having an alkoxysilyl group. More particularly, the present invention relates to vinyl resin of a low molecular weight which becomes a cross-linkable resin having an excellent physical strength after condensation of alkoxysilylalkyl thioether groups at both termini of the molecule and is useful as an ingredient for paints, adhesives, sealants, pressure-sensitive adhesives and the like, and further has a good workability due to its proper resin viscosity or solution viscosity when used, and a process for preparation thereof.


BACKGROUND ART

Hitherto, an introduction of reactive silyl groups into acrylic resins has been attempted from the viewpoints that silicone resins have an excellent weatherability, heat resistance and chemical resistance and that acrylic resins have an excellent weatherability and heat resistance.
The present inventors have already succeeded in preparation of telechelic vinyl resins where alkoxysilyl groups are introduced at both terminals, by subjecting disulfide compounds having a specific alkoxysilyl group and various vinyl monomers including an acrylic monomer to photopolymerization reaction, which is a pending patent application (see Japanese Patent Application No. 211667/1985 =U.S. Ser. No. 086241 now abandoned and EP-A-0217178). However, in case that the vinyl resins have too high number average molecular weight, resin viscosity or solution viscosity of the resins becomes extremely high, resulting in a decreased workability when used. Further it has problems during the preparation, i.e. when the disulfide compounds and the acrylic monomers are subjected to photopolymerization reaction, owing to exothermic reaction by rapid polymerization, the temperature inside the vessel is remarkably raised, which induces an extreme increase in a viscosity or gelation of the produced polymer. In addition, when the reaction is conducted on a large scale, the inner pressure of the reaction vessel increases by the exothermic reaction, which creates a too dangerous condition to continue the reaction.
Under such circumstances, the present inventors have studies intensively to solve the above-mentioned problems. As a result, the present inventors have found that vinyl resins of a low molecular weight having a good workability when used can be prepared by employing a specific tetrasulfide compound in addition to the disulfide compound in the above photopolymerization reaction and by specifying a ratio of the reaction components and that the photopolymerization reaction can be carried out safely even on a large amount scale by controlling the generation of heat through decrease of a polymerization rate. Thus the present invention has now been completed.


DISCLOSURE OF THE INVENTION

That is, the present invention provides a process for preparing vinyl resins of a low molecular weight having alkoxysilylalkyl thioether groups at both termini, which comprises subjecting 1 to 20 parts (parts by weight, hereinafter the same) of one or more of a disulfide compound represented by the formula: ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and are each on alkyl having 1 to 4 carbon atoms, R.sup.3 is an alkylene having 1 to 4 carbon atoms, and n is an integer of 0 to 2, 0.01 to 1 part of one or more of a tetrasulfide compound represented by the formula: wherein R.sup.1, R.sup.2, R.sup.3 and n are the same as defined above, and 100 parts of one or more of a vinyl monomer represented by the formula: wherein R.sup.4 is hydrogen atom or methyl, Y.sup.1 is a carboxyalkyl (or phenylalkyl or cycloalkyl) ester group, phenyl or a halogen atom, Y.sup.2 is a carboxyalkyl ester group having 2 to 6 carbon atoms or a halogen atom and Y.sup. 3 is fluorine atom or chlorine atom to photopolymerization reaction, and also provides the vinyl resins of a low molecular weight prepared by the above process.
The above disulfide compounds employed in the present invention include, for example:
One or more of the above d

REFERENCES:
patent: 2396997 (1946-03-01), Fryling
patent: 2906741 (1959-09-01), Hwa
patent: 3931355 (1976-01-01), Rudolph et al.
patent: 4146697 (1979-03-01), White
patent: 4543403 (1985-09-01), Isayama et al.

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