Telecentric sub-field deflection with vail

Details Telecentric sub-field deflection with vail Telecentric sub-field deflection with vail

1988-01-11

1989-08-22

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With target means

250396ML, H01J 3720

Patent

active

048598569

ABSTRACT:
A two staqge, electron beam projection system includes a target, a source of an electron beam and means for projecting an electron beam towards the target with its upper surface defining a target plane. A magnetic projection lens has a principal plane and a back focal plane located between said means for projecting and the target. The means for projecting provides an electron beam directed towards the target. First stage means provides deflection of the beam from area to area within a field. Second stage means provides for deflection of the beam for providing deflection of the beam within an area within a field. The beam crossing the back focal plane produces a telecentric condition of the beam in the image plane with the beam substantially normal to the target plane from the principal plane to the target plane. The magnetic projection lens includes a magnetic structure providing for magnetic compensation positioned within the bore of the projection lens, which produces a compensating magnetic field substantially proportional to the first derivative of the axial magnetic projection field. The axial magnetic projection field provides substantially a zero first derivative of the axial magnetic projection field in the vicinity of the target. The projection system projects on the target plane from the projection system as deflected by the upper and lower stages, at all times maintaining the telecentric condition of the electron beam at the target plane throughout the entire range of deflection of the beam, assuring minimum errors due to target height variations.

REFERENCES:
patent: 4140913 (1979-02-01), Anger et al.
patent: 4544846 (1985-10-01), Langer et al.

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