Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-08-22
2006-08-22
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S728000, C156S345440, C216S071000
Reexamination Certificate
active
07093560
ABSTRACT:
A clamping ring configured to be coupled to a chamber structure of a plasma processing chamber is disclosed. The clamping ring has a plurality of holes for accommodating a plurality of fasteners. The clamping ring includes a plurality of flanges disposed around an outer periphery of the clamping ring, adjacent flanges of the plurality of flanges being disposed such that a hole of the plurality of holes that is disposed in between the adjacent flanges is about equidistant from the adjacent flanges. The plurality of flanges are configured to mate with the chamber structure. The clamping ring and the flanges are dimensioned such that when the plurality of flanges mate with the chamber structure, recesses between adjacent ones of the plurality of flanges form gaps between the clamping ring and the chamber structure.
REFERENCES:
patent: 5292399 (1994-03-01), Lee et al.
patent: 5573596 (1996-11-01), Yin
patent: 6166898 (2000-12-01), Lee et al.
patent: 6364957 (2002-04-01), Schneider et al.
patent: 6394026 (2002-05-01), Wicker et al.
Lenz Eric H.
Tong Jose
Dhingra Rakesh K
Hassanzadeh Parviz
IP Strategy Group, P.C.
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