Techniques for forming optical electronic integrated circuits ha

Details Techniques for forming optical electronic integrated circuits ha Techniques for forming optical electronic integrated circuits ha

1997-05-21

1999-06-29

Ngo, Hung N.

Optical waveguides

Integrated optical circuit

385132, 385131, G02B 610

Patent

active

059179678

ABSTRACT:
An optical electronic integrated circuit (OEIC) having optical waveguides as device interconnects. An optical waveguide is formed by depositing, in an oxygen-free atmosphere, a film of semiconductor material on a semiconductor substrate at a temperature that substantially diminishes the porosity of the film and the diffusion of material from the substrate into the film. The semiconductor film, which has an index of refraction greater than that of the substrate, is etched to form the optical waveguide on the substrate. The substrate also supports a to plurality of active optical devices between which the optical waveguide extends. The substrate is preferably formed from gallium-arsenide and the waveguide from germanium. The active devices may also include these materials as well as aluminum-gallium-arsenide. When using these materials, the germanium film is deposited in an oxygen-free environment at about 100 degrees centigrade.

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Foti et al. "Effect of structure and impurities on the epitaxial regrowth of amorphous silicon." Applied Physics Letters, vol. 36, No. 10, pp. 840-842, May 1980.

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