Techniques for filtering systematic differences from wafer...

Details Techniques for filtering systematic differences from wafer... Techniques for filtering systematic differences from wafer...

2011-08-02

2011-08-02

Barbee, Manuel L (Department: 2857)

Data processing: measuring, calibrating, or testing

Testing system

Of circuit

C702S081000, C324S512000

Reexamination Certificate

active

07991574

ABSTRACT:
A method, system and computer program product for filtering systematic differences from wafer evaluation parameters provides an efficient visual display and numerical map technique for observing wafer-level process variation. Measurement data is gathered from electronic circuits at multiple positions within multiple regions on one or more wafers and parameters are computed from the measurement data, which may be the measurement data values themselves. The set of parameters is filtered for expected systematic variation by computing a set of normalization values from the set of parameters and normalizing the data according to the normalization values. The normalized parameter set is then either presented in a visual display, e.g., by color mapping, or arranged in a numerical map of parameter value by location.

REFERENCES:
patent: 5381103 (1995-01-01), Edmond et al.
patent: 6057924 (2000-05-01), Ross et al.
patent: 2008/0244348 (2008-10-01), Kadosh et al.
Gattiker, et al., “Data Analysis Techniques for CMOS Technology Characterization and Product Impact Assessment”, International Test Conference 2006, Lecture 3.3, pp. 1-10, IEEE Press.
Wong, et al., “Linewidth Variation Characterization by Spatial Decomposition”, JMMM, Jul. 2002, vol. 1, No. 2, Society of Photo-Optical Instrumentation Engineers.
Cain, et al., “Electrical Linewidth Metrology for Systematic CD Variation Characterization and Causal Analysis”, Proceedings of SPIE 2003, pp. 350-361, vol. 5308.
Cain, et al., “Optimum Sampling for Characterization of Systematic Variation in Photolithography”, Proceedings of SPIE 2002, vol. 4689, SPIE , pp. 430-442.
Bhushan, et al., “Ring Oscillators for Process Tuning and Variability Control”, IEEE Transactions in Semiconductor Manufacturing, Feb. 2006, pp. 10-18, vol. 19, No. 1, IEEE Press.

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