Technique for producing antireflection grating surfaces on diele

Details Technique for producing antireflection grating surfaces on diele Technique for producing antireflection grating surfaces on diele

1988-07-26

1991-04-16

Arnold, Bruce Y.

35016217, 350320, 350166, G02B 2600, G02F 100

Patent

active

050077082

ABSTRACT:
A method of forming an antireflection rectangular-groove surface-relief grating on a lossy substrate exposed to incident waves of transverse electric or transverse magnetic or combination of polarizations and any angle of incidence in a lossless medium. The required thickness and complex refractive index of a single homogeneous layer on a lossy substrate to produce zero reflectivity is first computed using an impedance matching approach. The filling factor and groove depth of the rectangular groove surface-relief grating that is equivalent to the single homogeneous layer in the long-wavelength limit are then calculated. The surface-relief grating is then formed on the lossy substrate by reactive ion etching, electron beam lithography, or holography.

REFERENCES:
patent: 4255019 (1981-03-01), Knot
patent: 4501784 (1985-02-01), Moshinsky
patent: 4545646 (1985-10-01), Chern et al.
patent: 4660934 (1987-04-01), Akisa et al.
patent: 4666250 (1987-05-01), Soothwell
patent: 4765705 (1988-08-01), Seymour et al.
patent: 4806442 (1989-02-01), Shirasaki et al.

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