Technique for in situ calibration of a gas detector

Details Technique for in situ calibration of a gas detector Technique for in situ calibration of a gas detector

1975-09-25

1981-01-27

Tung, T.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204 1T, G01N 2746

Patent

active

042473802

ABSTRACT:
In a gas measuring probe assembly having a gas sensing device within a tubular housing positioned within a gas environment to be monitored, a tubular calibration gas flow pattern is established within the tubular housing substantially parallel to the walls of the tubular housing to sweep the monitored gas environment from the tubular housing and expose the gas sensing device to a calibration gas mixture substantially free of the monitored gas environment. This technique permits the in situ calibration of gas detectors, and is especially useful in calibrating stack gas monitoring probes.

REFERENCES:
patent: 3223608 (1965-12-01), Hersch
patent: 3546086 (1970-12-01), Sayles
patent: 3597345 (1971-08-01), Hickam et al.
patent: 3598711 (1971-08-01), Flais
patent: 3699032 (1972-10-01), Rapp
patent: 3791937 (1974-02-01), Besson et al.
patent: 3835012 (1974-09-01), Hemak
patent: 3838021 (1974-09-01), Arbiter
patent: 3909385 (1975-09-01), Spielberg et al.
patent: 3915828 (1975-10-01), Cleary et al.
patent: 3928161 (1975-12-01), McIntyre et al.
patent: 3948604 (1976-04-01), Hoppesch

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