Technique for controlling emitter ballast resistance

Details Technique for controlling emitter ballast resistance Technique for controlling emitter ballast resistance

1978-11-01

1980-10-28

Edlow, Martin H.

357 65, 357 36, 357 38, 29589, 29591, H01L 2348

Patent

active

042310598

ABSTRACT:
A transistor in which this effective emitter resistance which is determined by the geometry of the emitter metallization as disclosed. In the preferred embodiment, the emitter metallization comprises a series of circular "dots" which are distributed over the entire emitter area. The area of the "dots" with respect to the entire emitter area is selected such that the desired effective emitter resistance is achieved.

REFERENCES:
patent: 3878550 (1975-04-01), Benjamin
patent: 3895977 (1975-07-01), Sanders
patent: 3975754 (1976-08-01), Lehman
patent: 4008484 (1977-02-01), Maekawa
patent: 4060825 (1977-11-01), Schlegel
patent: 4127863 (1978-02-01), Kurata

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