Targets for cathode sputtering

Details Targets for cathode sputtering Targets for cathode sputtering

1984-01-10

1987-03-03

Demers, Arthur P.

Compositions: ceramic

Ceramic compositions

Titanate, zirconate, stannate, niobate, or tantalate or...

204298, 20419215, 20419229, C04B 3546, C23C 1400

Patent

active

046475486

ABSTRACT:
Oxide-ceramic targets which can be used in magnetically enhanced cathode sputtering and which are based on hot-pressed indium oxide/tin oxide mixtures, which have a density of at least 75% of the theoretical density and which have been diminished to such an extent in the oxygen content compared with the stoichiometric composition that they have an electrical conductivity which corresponds to a specific resistance of 0.6 to 0.1 .OMEGA..multidot. cm can be prepared by compression-molding the metal oxide mixture in a reducing atmosphere under a pressure of 50 to 600 kg/cm.sup.2 and at a temperature of 850.degree. to 1,000.degree. C.
The targets can be used in direct-voltage sputtering.

REFERENCES:
patent: 3907660 (1975-09-01), Gillery
patent: 4025339 (1977-05-01), Kuehnle
patent: 4060426 (1977-11-01), Zinchuk
patent: 4065600 (1977-12-01), King et al.
patent: 4124474 (1978-11-01), Bomchil
patent: 4166784 (1979-09-01), Chapin et al.
patent: 4201649 (1980-05-01), Gillery
patent: 4400254 (1983-08-01), Freller et al.
Fraser, et al., J. Electro. Chem. Soc. 119 (1972) pp. 1368-1374.

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