Targeted deposition of nanotubes

Details Targeted deposition of nanotubes Targeted deposition of nanotubes

2005-03-15

2005-03-15

Chen, Bret (Department: 1762)

Coating processes

Nonuniform coating

Mask or stencil utilized

C427S288000, C427S598000, C427S372200

Reexamination Certificate

active

06866891

ABSTRACT:
A method for targeted deposition of a nanotube on a planar surface includes providing a ram made from elastomeric material and having a relief structure on its surface. A microfluid capillary system, with an inlet and an outlet, is then formed by applying the ram to a planar substrate. A dispersion of nanotubes is brought into contact with the inlet, thereby enabling capillary force to disperse the nanotubes. through the microfluid capillary system. The resulting dispersion of nanotubes is then dried and the ram removed.

REFERENCES:
patent: 6555945 (2003-04-01), Baughman et al.
patent: 6659598 (2003-12-01), Grimes et al.
patent: 6682677 (2004-01-01), Lobovsky et al.
patent: 6712864 (2004-03-01), Horiuchi et al.
patent: 6723279 (2004-04-01), Withers et al.
patent: 6753108 (2004-06-01), Hampden-Smith et al.
patent: 20020125470 (2002-09-01), Hoenlein et al.
patent: 100 38 124 (2002-02-01), None
M. Fujiwara, et al., “Magnetic Orientation and Magnetic Properties of a Single Carbon Nanotube,” J. Phys. Chem., vol. 105, No. 18, pp. 1-4 (May 10, 2001).
A. Bachtold, et al., “Logic Circuits with Carbon Nanotube Transistors,” vol. 294, pp. 1317-1320 (Nov. 9, 2001).
Xia et al., “Softlithographie,” Angewandte Chemie (Applied Chemistry), vol. 110,, pp. 569-594 (1998).

Affiliated with

Also associated with

Rating

Targeted deposition of nanotubes does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Targeted deposition of nanotubes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Targeted deposition of nanotubes will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3414838