Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2003-06-20
2010-10-12
Nguyen, Nam X (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298020, C204S298210
Reexamination Certificate
active
07811429
ABSTRACT:
The invention relates to a target support assembly (1) comprising a support (2), on which a target lining is arranged. In order to simplify the production of the target lining or of the target support assembly and/or the placement of the target lining on the support, the target lining is formed by a target sleeve (4) that is slid onto the support (2). At least one clamping element (5) is placed, while actively clamping, between the support (2) and the target sleeve (4).
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Herwig Wilhelm
Landgraf Ralf
Berman Jason M
Interpane Entwicklungs - und Beratungsgesellschaft mbH & Co
Nguyen Nam X
Scully , Scott, Murphy & Presser, P.C.
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