Target plate for cathode sputtering

Details Target plate for cathode sputtering Target plate for cathode sputtering

1985-07-17

1987-05-26

Niebling, John F.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

2041921, C23C 1400

Patent

active

046683739

ABSTRACT:
In conventional attachments of target plates for cathode sputtering the danger always existed that they will become plastically deformed at the operating temperature and detach from a cooling support. For secure attachment without fastening means on the front side to be disintegrated, the target plate according to the invention presents on its back a cutout (4) in which there is inserted by means of a mechanical spring union, e.g. by means of a lock ring (8), an auxiliary body (6) of a material of higher strength and higher softening point than the material to be disintegrated, which body has a threaded bore (12) for attachment of the target plate on a support (1).

REFERENCES:
patent: 3595775 (1971-07-01), Grantham et al.
patent: 3838031 (1974-09-01), Snaper
patent: 4448653 (1984-05-01), Wegmann
patent: 4517070 (1985-05-01), Kisner
patent: 4556471 (1985-12-01), Bergman et al.

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