Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1986-07-09
1988-05-31
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041921, C23C 1434
Patent
active
047479272
ABSTRACT:
Cathode disintegration targets which during sputtering are exposed to a very high thermal load have heretofore been pressed against a cooling support from the side to be sputtered by means of bars and screws, to cool them. According to invention it is proposed to make the target plate in several parts and to provide on the sides where the individual parts abut mutually correlated cutouts, pairs of which form a cavity into which an auxiliary element, preferably a plate with threaded bores, can be inserted for attachment from the cooling support side.
REFERENCES:
patent: 3838031 (1974-09-01), Snaper
patent: 4414086 (1983-11-01), Lamont, Jr.
patent: 4421628 (1983-12-01), Quaderer
patent: 4428816 (1984-01-01), Class et al.
patent: 4448652 (1984-05-01), Pachonik
patent: 4485000 (1984-11-01), Kawaguchi et al.
patent: 4515675 (1985-05-01), Kieser et al.
patent: 4517070 (1985-05-01), Kisner
Bracher Bernhard
Polacek Robert
Rille Eduard
Balzers Aktiengesellschaft
Nguyen Nam X.
Niebling John F.
LandOfFree
Target plate for cathode disintegration does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Target plate for cathode disintegration, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Target plate for cathode disintegration will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1872654