Target of intermetallic compound with B2-ordered lattice structu

Details Target of intermetallic compound with B2-ordered lattice structu Target of intermetallic compound with B2-ordered lattice structu

1998-08-06

2000-12-12

Kiliman, Leszek

Stock material or miscellaneous articles

Composite

Of inorganic material

428694TS, 428900, 2041922, 20429812, 20429813, G11B 566

Patent

active

061596256

ABSTRACT:
A target for sputter-depositing a B2-structured thin film for an underlayer of a magnetic recording medium. Since the target is made of a sintered body of an intermetallic compound being substantially a B2-ordered lattice structure, the target has a uniform small grain size and a high bending strength. The target produces a thin film with a small grain size and a minimized particle deposition.

REFERENCES:
patent: 5693426 (1997-12-01), Lee et al.
patent: 5863398 (1999-01-01), Kardokus
patent: 5882493 (1999-03-01), Iwasaki
patent: 5896553 (1999-04-01), Lo
patent: 5997704 (1999-12-01), Shiouo
IEEE Transactions on Magnetics, vol. 30, No. 6, Nov. 1994, pp. 3951-3953, "NiAI Underlayers For CoCrTa Magnetic Thin Films", Li-Lien Lee et al.
IEEE Transactions on Magnetics, vol. 31, No. 6, Nov. 1995, pp. 2728-2730, "Effects of Cr Intermediate Layers on CoCrPt Thin Film Media on NiAI Underlayers", Li-Lien Lee et al.
Lee, et al. "NiAI Underlayers . . . " IEEE Transactions on Magnetics, vol. 30, No. 6, Nov. 1994.

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