Metal treatment – Process of modifying or maintaining internal physical... – Heating or cooling of solid metal
Reexamination Certificate
2006-01-13
2009-11-17
King, Roy (Department: 1793)
Metal treatment
Process of modifying or maintaining internal physical...
Heating or cooling of solid metal
Reexamination Certificate
active
07618505
ABSTRACT:
Provided is high purity nickel or nickel alloy target for Magnetron sputtering having superior sputtering film uniformity and in which the magnetic permeability of the target is 100 or more, and this high purity nickel or a nickel alloy target for magnetron sputtering capable of achieving a favorable film uniformity (evenness of film thickness) and superior plasma ignition (firing) even during the manufacturing process employing a 300 mm wafer. The present invention also provides the manufacturing method of such high purity nickel or nickel alloy target.
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Patent Abstracts of Japan, 1 page English Abstract of JP 09-157843, Jun. 1997.
Miyashita Hirohito
Yamakoshi Yasuhiro
Howson & Howson LLP
King Roy
Nippon Mining & Metals Co., Ltd.
Roe Jessee R.
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