Target material of metal silicide

Details Target material of metal silicide Target material of metal silicide

1997-06-10

1999-07-06

Sheehan, John

Metal treatment

Stock

Chromium, molybdenum, or tungsten base

420429, 420430, C22C 2704, C22C 2206

Patent

active

059193212

ABSTRACT:
A novel metal silicide target material is provided which can effectively restrict the occurrence of fine particles. The target material has a structure comprising metal silicide and free silicon, which material has a relative density more than 100% which relative density is defined by a ratio of a true density of the target material to a theoretical density obtained by calculation, and free silicon portions in the structure of the target material which free silicon portions are provided with Vickers hardness less than 1,100 or which free silicon portions are provided with dislocation-undetectable areas each having a diameter not less than 1 .mu.m. Further, it is desirable that a rupture load evaluated by acoustic emission at which rupture load there occurs rupture in a scratching test of the surface of target material by acoustic emission is not less than 50N.

REFERENCES:
patent: 3688018 (1972-08-01), Hiscocks
patent: 3754168 (1973-08-01), Cunningham et al.
patent: 4619695 (1986-10-01), Oikawa et al.
patent: 4721991 (1988-01-01), Ohtaki et al.
patent: 5013526 (1991-05-01), Kobayashi et al.
patent: 5595616 (1997-01-01), Berczik

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