Target for sputtering

Details Target for sputtering Target for sputtering

1985-11-14

1986-09-09

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419215, C23C 1500

Patent

active

046107746

ABSTRACT:
A sputtering target structure suitable for use with a planar magnetron sputtering electrode device has a plurality of annular target members arranged concentrically. The annular target member is provided with either an annular groove for concentration of an electric field or an annular wall for repelling electrons.

REFERENCES:
patent: 3669871 (1972-06-01), Elmgren et al.
patent: 4401539 (1983-08-01), Abe et al.
patent: 4444635 (1984-04-01), Kobayashi
patent: 4448659 (1984-05-01), Morrison
patent: 4472259 (1984-09-01), Class et al.
patent: 4547279 (1985-10-01), Kiyota et al.
patent: 4569746 (1986-02-01), Hutchinson

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