Target for cathode sputtering apparatus

Details Target for cathode sputtering apparatus Target for cathode sputtering apparatus

1994-06-16

1996-02-13

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429812, C23C 1435

Patent

active

054909155

ABSTRACT:
A sputtering target, magnetron sputtering source using the sputtering target, and vacuum coating apparatus using the magnetron source, wherein the performance of the target is improved by providing a concave ring shaped sputtering surface on the target which is continuously curved between an inner rim area and an outer rim area of the target.

REFERENCES:
patent: 4957605 (1990-09-01), Hurwitt et al.
patent: 5133850 (1992-07-01), Kukla et al.
patent: 5174875 (1992-12-01), Hurwitt et al.

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