Target cooling system with trough

Details Target cooling system with trough Target cooling system with trough

1993-12-28

1995-06-06

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429812, 20429819, C23C 1434

Patent

active

054219787

ABSTRACT:
Cathode sputtering apparatus includes a target, a cooling channel, and a flexible diaphragm therebetween. The target is fixed to a base independently of the diaphragm, so that the target can be replaced with disturbing the cooling channel. In a preferred embodiment, the diaphragm and the target are fixed by respective sets of cleats retained by screws received from respective opposite directions.

REFERENCES:
patent: 4826584 (1989-05-01), dos Santos Pereiro Ribeiro
patent: 5039913 (1991-08-01), Wegmann et al.
patent: 5071535 (1991-12-01), Hartig et al.
patent: 5203980 (1993-04-01), Cremer et al.
patent: 5259941 (1993-11-01), Munz
patent: 5269894 (1993-12-01), Kerschbaumer
Lake, M. R., Harding, G. L. Cathode Cooling Apparatus for a Planar Magnetron . . . , J. VAc. Sci. Technol. A2(3), Jul. Sep. 1984, pp. 1391-1393.
Rastogi et al., Simple Planar Magnetron Sputtering Source., Rev. Sci. Instrum. 58(8) Aug. 1987 pp. 1505-1506.

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