Target chamber shielding

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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Details

H01J 3720

Patent

active

054554268

ABSTRACT:
A system for removal of contaminating particles from a target chamber (1) which comprises the target chamber having an aperture (3) for entry of an ion beam (2) therein, an orienting device (7, 9, 13, 15) within the target chamber for orienting a wafer (11) with respect to the ion beam and a reusable, removable shield (23), preferably of stainless steel, disposed along the interior walls of the target chamber and secured to the interior walls. A securing device (24) is provided for releasably securing the shield to the interior walls of the target chamber.

REFERENCES:
patent: 5229615 (1993-07-01), Brune et al.

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