Optical waveguides – With optical coupler – Particular coupling structure
Reexamination Certificate
2006-01-31
2006-01-31
Ullah, Akm Enayet (Department: 2874)
Optical waveguides
With optical coupler
Particular coupling structure
C385S030000, C438S031000, C438S040000
Reexamination Certificate
active
06993225
ABSTRACT:
Methods of forming a tapered evanescent coupling region for use with a relatively thin silicon optical waveguide formed with, for example, an SOI structure. A tapered evanescent coupling region is formed in a silicon substrate that is used as a coupling substrate, the coupling substrate thereafter joined to the SOI structure. A gray-scale photolithography process is used to define a tapered region in photoresist, the tapered pattern thereafter transferred into the silicon substrate. A material exhibiting a lower refractive index than the silicon optical waveguide layer (e.g., silicon dioxide) is then used to fill the tapered opening in the substrate. Advantageously, conventional silicon processing steps may be used to form coupling facets in the silicon substrate (i.e., angled surfaces, V-grooves) in an appropriate relation to the tapered evanescent coupling region. The coupling facets may be formed contiguous with the tapered evanescent coupling region, or formed through the opposing side of the silicon substrate.
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Ghiron Margaret
Gothoskar Prakash
Montgomery Robert Keith
Patel Vipulkumar Kantilal
Rahll Jerry T
SiOptical Inc.
Ullah Akm Enayet
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