Etching a substrate: processes – Forming or treating electrical conductor article
Reexamination Certificate
2007-08-14
2007-08-14
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating electrical conductor article
C216S041000, C029S846000, C029S849000, C427S098300, C174S250000, C174S262000
Reexamination Certificate
active
11023162
ABSTRACT:
A method for fabricating a tape substrate includes forming, on an insulating film, a copper foil pattern having a connecting area; coating a solder resist on the formed copper foil pattern, at a region other than the connecting area; plating a barrier layer on the copper foil pattern at the connecting area after the coating of the solder resist; and plating tin on the plated barrier layer plated, thereby forming a tin layer on the barrier layer. Another method for fabricating a tape substrate includes forming, on an insulating film, a copper foil pattern having a connecting area; plating a barrier layer over the formed copper foil pattern; plating tin over the barrier layer after the plating of the barrier layer, thereby forming a tin layer over the barrier layer; and coating a solder resist on the tin layer at a region other than the connecting area, after the formation of the tin layer.
REFERENCES:
patent: 2004/0161626 (2004-08-01), Kwon et al.
patent: 2002289653 (2002-10-01), None
Cho Yoon Kuen
Hong Ki Pyo
Kwon Soon Bog
Lee Sang Hun
Moon Yang Sik
Ahmed Shamim
Birch & Stewart Kolasch & Birch, LLP
LG Micron Co., Ltd.
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