Tantalum sputtering target and method of fabrication

Details Tantalum sputtering target and method of fabrication Tantalum sputtering target and method of fabrication

2011-08-16

2011-08-16

King, Roy (Department: 1733)

Metal treatment

Stock

Vanadium, niobum, or tantalum base

C148S668000

Reexamination Certificate

active

07998287

ABSTRACT:
A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.

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