Abrasive tool making process – material – or composition – With inorganic material
Reexamination Certificate
2003-03-25
2009-02-17
Marcheschi, Michael A (Department: 1793)
Abrasive tool making process, material, or composition
With inorganic material
C051S308000, C051S309000, C106S003000, C510S380000, C510S397000, C510S175000, C510S367000, C510S368000
Reexamination Certificate
active
07491252
ABSTRACT:
A chemical mechanical planarization solution is useful for removing tantalum barrier materials. The solution includes by weight percent 0 to 25 oxidizer, 0 to 15 inhibitor for a nonferrous metal and 0 to 20 complexing agent for the nonferrous metal, 0.01 to 12 tantalum removal agent selected from the group consisting of formamidine, formamidine salts, formamidine derivatives, guanidine derivatives, guanidine salts and mixtures thereof, 0 to 5 abrasive, 0 to 15 total particles selected from the group consisting of polymeric particles and polymer-coated coated particles and balance water. The solution has a tantalum nitride to TEOS selectivity of at least 3 to 1 as measured with a microporous polyurethane polishing pad pressure measure normal to a wafer less than 20.7 kPa.
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Biederman Blake T.
Marcheschi Michael A
Rohm and Haas Electronic Materials CMP Holdings Inc.
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