Tantalum and niobium reagents useful in chemical vapor depositio

Details Tantalum and niobium reagents useful in chemical vapor depositio Tantalum and niobium reagents useful in chemical vapor depositio

1994-09-16

1997-10-21

Nazario-Gonzalez, Porfirio

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

501 1, C07F 900, C04B 3500

Patent

active

056798156

ABSTRACT:
Niobium and tantalum compounds suitable for use as chemical vapor deposition source reagents, and a process for depositing niobium- or tantalum-containing coatings using the compounds. The compounds have formula

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