Refrigeration – Low pressure cold trap process and apparatus
Patent
1994-09-26
1996-02-06
Capossela, Ronald C.
Refrigeration
Low pressure cold trap process and apparatus
118715, B01D 800
Patent
active
054888336
ABSTRACT:
A cold trap for condensing and polymerizing residual vapor. The cold trap comprises a containment vessel which comprises a vertical sidewall defining a cylindrical inner surface of substantially constant diameter. Fluidly connected to the sidewall is a vapor inlet line which enters the containment vessel tangentially at a point near the top end thereof such that the vapor entering the containment vessel through the vapor inlet line will impinge against the inner surface of the sidewall and flow in a generally rotational pattern within the containment vessel. The cold trap further comprises a cooling member which is positioned within the containment vessel for facilitating the condensation and polymerization of the vapor.
REFERENCES:
patent: 3044270 (1962-07-01), Biever
patent: 3288728 (1966-11-01), Gorham
patent: 3300332 (1967-01-01), Gorham
patent: 3342754 (1967-09-01), Gorham
patent: 3385953 (1968-05-01), Henneberger
patent: 3472795 (1969-10-01), Tittman
patent: 3603903 (1970-03-01), Shaw
patent: 3699216 (1971-08-01), Stewart
patent: 3712074 (1973-01-01), Boissin
patent: 3719166 (1970-12-01), Gereth
patent: 3753773 (1973-08-01), Lee
patent: 3895135 (1975-07-01), Hofer
patent: 3908046 (1975-09-01), Fitzpatrick et al.
patent: 4508054 (1985-04-01), Baumberger et al.
patent: 4592306 (1986-06-01), Gallego
patent: 4649859 (1987-03-01), Wanlass
patent: 4683143 (1987-07-01), Riley
patent: 4760244 (1988-07-01), Hokynar
patent: 4825808 (1989-05-01), Takahashi et al.
patent: 4852516 (1989-08-01), Rubin et al.
patent: 4945856 (1990-08-01), Stewart
patent: 5030810 (1991-07-01), Haley et al.
patent: 5078091 (1992-08-01), Stewart
patent: 5128515 (1992-07-01), Tanaka
patent: 5167718 (1992-12-01), Stewart
patent: 5268033 (1993-12-01), Stewart
Brochure--Union Carbide, re: Parylene Deposition Systes, 1979.
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