Tandem mirror plasma confinement apparatus

Details Tandem mirror plasma confinement apparatus Tandem mirror plasma confinement apparatus

1977-06-16

1978-11-14

Engle, Samuel W.

176 5, 176 9, G21B 100

Patent

active

041254317

ABSTRACT:
Apparatus and method for confining a plasma in a center mirror cell by use of two end mirror cells as positively charged end stoppers to minimize leakage of positive particles from the ends of the center mirror cell.

REFERENCES:
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patent: 3437871 (1969-04-01), Cann et al.
patent: 3655508 (1972-04-01), Hirsch
patent: 3688067 (1972-06-01), Christofilos
patent: 3723703 (1973-03-01), Ehlers et al.
patent: 3728217 (1973-04-01), Dandl
patent: 3755073 (1973-08-01), Haught et al.
1 Plasma Physics, 503 (1967), pp. 503-505, Kelley.
2 Soviet Journal of Plasma Physics, 597 (July-August 1976) Dimov et al.
"Open Trap with Ambipolar Mirrors", Dimov et al., Proc. 6th Int. Conf. Plas. Phys. & CNF Research (10/6-131-76), UCRL, 50002-75, pp. 1-140.

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