Tailored reflecting diffractor for EUV lithographic system...

Photocopying – Projection printing and copying cameras – Focus or magnification control

Reexamination Certificate

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C355S053000, C355S067000

Reexamination Certificate

active

06867846

ABSTRACT:
A wavefront measurement system includes a source of electromagnetic radiation. An imaging system directs the electromagnetic radiation at an object plane that it uniformly illuminates. A first grating is positioned in the object plane to condition the radiation entering the input of a projection optic. A projection optical system projects an image of the first grating onto the focal plane. A second grating is positioned at the focal plane that receives a diffracted image of the source to form a shearing interferometer. A CCD detector receives the image of the first grating through the projection optical system and the second grating that forms a fringe pattern if there are aberrations in the projection optical system. Phaseshift readout of fringe pattern can be accomplished by stepping the first grating in a lateral direction and reading each frame with the CCD detector. The first grating includes a plurality of reflecting lines each formed by a plurality of reflecting dots. The first grating has a pitch that is ½ times the magnification of the projection system times the pitch of the second grating for achromatic operation.

REFERENCES:
patent: 4413909 (1983-11-01), Pohle
patent: 5333050 (1994-07-01), Nose et al.
patent: 6360012 (2002-03-01), Kreuzer
patent: 6373553 (2002-04-01), Singh
patent: 6573997 (2003-06-01), Goldberg et al.
patent: 6650399 (2003-11-01), Baselmans et al.

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