Table top parylene deposition chamber

Details Table top parylene deposition chamber Table top parylene deposition chamber

1991-07-01

1993-12-07

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118724, 118726, 118728, 118730, 4272556, 219390, 474133, C23C 1600

Patent

active

052680339

ABSTRACT:
Disclosed is a table top parylene deposition system wherein reactive monomer vapor enters a deposition chamber tangentially so as to create a rotational flow of vapor within the interior of the chamber. A substrate support fixture is positioned within the chamber and rotated in a direction counter to the rotational flow of vapor.

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Union Carbide Brochure, re Parylene Deposition Systems, 1979.

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