Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-05-22
2007-05-22
Kackar, Ram N. (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345300, C118S715000, C204S298010
Reexamination Certificate
active
10753625
ABSTRACT:
The present invention provides members that are provided around a susceptor for mounting a semiconductor in a chamber for a semiconductor production system. Each member has a function of independently generating heat to heat the semiconductor, at least by radiation, and preferably, a heat generating element is embedded in each member.
REFERENCES:
patent: 5798016 (1998-08-01), Oehrlein et al.
patent: 6171438 (2001-01-01), Masuda et al.
patent: 2001/0054381 (2001-12-01), Umotoy et al.
patent: 05275385 (1993-10-01), None
patent: 05-326112 (1993-12-01), None
patent: 2001-274103 (2001-10-01), None
Goto Yoshinobu
Tsuruta Hideyoshi
Burr & Brown
Kackar Ram N.
NGK Insulators Ltd.
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