Systems for measuring stresses in line features formed on...

Radiant energy – Photocells; circuits and apparatus – With circuit for evaluating a web – strand – strip – or sheet

Reexamination Certificate

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C250S559220

Reexamination Certificate

active

06924497

ABSTRACT:
Methods and systems for evaluating stresses in line features formed on substrates. Stresses may be computed from measured curvature information based on simple analytical functions. The curvature information can be obtained optically by, e.g., a coherent gradient sensing method, to obtain a full-field measurement of an illuminated area.

REFERENCES:
patent: 5227641 (1993-07-01), Cheng
patent: 5966019 (1999-10-01), Borden
patent: 6031611 (2000-02-01), Rosakis et al.
patent: 6469788 (2002-10-01), Boyd et al.
patent: 6513389 (2003-02-01), Suresh et al.
patent: 6600565 (2003-07-01), Suresh et al.
patent: 05-335217 (1993-12-01), None
L.B. Freuend, “Substratc Curvature Due to Thin Film Mismatch Strain In the Nonlinear Deformation Range”, Division of Engineering, Brown University, Providence, RI 02912, Jan. 1999.

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