Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2006-06-27
2006-06-27
Nguyen, Tu T. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
Reexamination Certificate
active
07068363
ABSTRACT:
Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.
REFERENCES:
patent: 4889998 (1989-12-01), Hayano et al.
patent: 5543919 (1996-08-01), Mumola
patent: 5555472 (1996-09-01), Clapis et al.
patent: 5555474 (1996-09-01), Ledger
patent: 5563709 (1996-10-01), Poultney
patent: 5680207 (1997-10-01), Hagiwara
patent: 5712701 (1998-01-01), Clementi et al.
patent: 5864394 (1999-01-01), Jordan, III et al.
patent: 5970168 (1999-10-01), Montesanto et al.
patent: 5999266 (1999-12-01), Takahashi et al.
patent: 6020957 (2000-02-01), Rosengaus et al.
patent: 6021214 (2000-02-01), Evans et al.
patent: 6034776 (2000-03-01), Germer et al.
patent: 6081325 (2000-06-01), Leslie et al.
patent: 6091493 (2000-07-01), Stover et al.
patent: 6118525 (2000-09-01), Fossey et al.
patent: 6122047 (2000-09-01), Stover et al.
patent: 6169601 (2001-01-01), Eremin et al.
patent: 6201601 (2001-03-01), Vaez-Iravani et al.
patent: 6208411 (2001-03-01), Vaez-Iravani
patent: 6215551 (2001-04-01), Nikoonahad et al.
patent: 6271916 (2001-08-01), Marxer et al.
patent: 6288780 (2001-09-01), Fairley et al.
patent: 6362923 (2002-03-01), Lange et al.
patent: 6496256 (2002-12-01), Eytan et al.
patent: 6515742 (2003-02-01), Ruprecht
patent: 6538730 (2003-03-01), Vaez-Iravani et al.
patent: 6608676 (2003-08-01), Zhao et al.
patent: 2002/0145732 (2002-10-01), Vez-Iravani et al.
patent: 4134747 (1993-04-01), None
patent: 98/25131 (1998-06-01), None
patent: 99/45340 (1999-09-01), None
patent: 02/082064 (2002-10-01), None
International Search Report, PCT/US2004/017707, mailed Nov. 5, 2004.
Bevis Christopher F.
Kirk Mike
Vaez-Iravani Mehdi
Daffer McDaniel LLP
KLA-Tencor Technologies Corp.
Mewherter Ann Marie
Nguyen Tu T.
LandOfFree
Systems for inspection of patterned or unpatterned wafers... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Systems for inspection of patterned or unpatterned wafers..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Systems for inspection of patterned or unpatterned wafers... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3699201