Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-03-06
2007-03-06
Mehta, Bhavesh M. (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
Reexamination Certificate
active
10676613
ABSTRACT:
The present invention relates to monitoring and controlling a reticle fabrication process (e.g. employed with an electron beam lithography process). A typical fabrication process involves discrete stages including exposure, post-exposure bake and development. After fabrication is complete, an inspection can be performed on the reticle to determine whether any parameters during fabrication and/or any data points are outside of acceptable tolerances. The data is collected and fed into an algorithm (e.g. data-mining algorithm) utilized to determine which fabrication parameters need to be modified then sends the data to a control system (e.g. advanced process control) to facilitate needed changes to the fabrication parameters.
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Phan Khoi A.
Singh Bhanwar
Subramanian Ramkumar
Advanced Micro Devices , Inc.
Amin Turocy & Calvin LLP
Lavin Christopher
Mehta Bhavesh M.
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