Systems and methods for thermally-induced aberration...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

07995185

ABSTRACT:
Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.

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English language abstract for JP 2005-012201 A, published Jan. 13, 2005; 1 page.
English language abstract for JP 2005-136404 A, published May 26, 2005; 1 page.
English language abstract for JP 2006-021502 A, published Jan. 26, 2006; 1 page.
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English translation of Notice of Reasons for Rejection directed to related Japanese Patent Application No. JP 2007-309574, mailed on Oct. 25, 2010 from the Japan Patent Office; 5 pages.

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