Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-04-22
2000-04-04
McDonald, Rodney
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429813, 118504, 118720, C23C 1434, C23C 1404
Patent
active
06045671&
ABSTRACT:
Methods and apparatus for the preparation of a substrate having an array of diverse materials in predefined regions thereon. A substrate having an array of diverse materials thereon is generally prepared by depositing components of target materials to predefined regions on the substrate, and, in some embodiments, simultaneously reacting the components to form at least two resulting materials. In particular, the present invention provides novel masking systems and methods for applying components of target materials onto a substrate in a combinatorial fashion, thus creating arrays of resulting materials that differ slightly in composition, stoichiometry, and/or thickness. Using the novel masking systems of the present invention, components can be delivered to each site in a uniform distribution, or in a gradient of stoichiometries, thicknesses, compositions, etc. Resulting materials which can be prepared using the methods and apparatus of the present invention include, for example, covalent network solids, ionic solids and molecular solids. Once prepared, these resulting materials can be screened sequentially, or in parallel, for useful properties including, for example, electrical, thermal, mechanical, morphological, optical, magnetic, chemical and other properties.
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Goldwasser Isy
Wang Youqi
Wu Xin Di
McDonald Rodney
Symyx Technologies Inc.
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