Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-07-26
2005-07-26
Rosenberger, Richard A. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
Reexamination Certificate
active
06922236
ABSTRACT:
Systems and methods for inspecting a surface of a specimen such as a semiconductor wafer are provided. A system may include an illumination system configured to direct a first beam of light to a surface of the specimen at an oblique angle of incidence and to direct a second beam of light to a surface of the specimen at a substantially normal angle. The system may also include a collection system configured to collect at least a portion of the first and second beams of light returned from the surface of the specimen. In addition, the system may include a detection system. The detection system may be configured to process the collected portions of the first and second beams of light. In this manner, a presence of defects on the specimen may be detected from the collected portions of the first and second beams of light.
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Biellak Steven
Nikoonahad Mehrdad
Stokowski Stan
Sullivan Jamie
Vaez-Iravani Mehdi
Daffer McDaniel LLP
KLA-Tencor Technologies Corp.
Mewherter Ann Marie
Rosenberger Richard A.
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