Radiant energy – Radiant energy generation and sources – With radiation modifying member
Reexamination Certificate
2007-02-13
2010-06-08
Vanore, David A (Department: 2881)
Radiant energy
Radiant energy generation and sources
With radiation modifying member
C250S492100, C378S119000, C372S005000, C372S082000, C372S087000
Reexamination Certificate
active
07732793
ABSTRACT:
Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
REFERENCES:
patent: 2759106 (1956-08-01), Wolter
patent: 3150483 (1964-09-01), Mayfield et al.
patent: 3232046 (1966-02-01), Meyer
patent: 3279176 (1966-10-01), Boden
patent: 3746870 (1973-07-01), Demarest
patent: 3960473 (1976-06-01), Harris
patent: 3961197 (1976-06-01), Dawson
patent: 3969628 (1976-07-01), Roberts et al.
patent: 4042848 (1977-08-01), Lee
patent: 4088966 (1978-05-01), Samis
patent: 4143275 (1979-03-01), Mallozzi et al.
patent: 4162160 (1979-07-01), Witter
patent: 4203393 (1980-05-01), Giardini
patent: 4223279 (1980-09-01), Bradford, Jr. et al.
patent: 4364342 (1982-12-01), Asik
patent: 4369758 (1983-01-01), Endo
patent: 4455658 (1984-06-01), Sutter et al.
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4534035 (1985-08-01), Long
patent: 4536884 (1985-08-01), Weiss et al.
patent: 4538291 (1985-08-01), Iwamatsu
patent: 4550408 (1985-10-01), Karning et al.
patent: 4561406 (1985-12-01), Ward
patent: 4596030 (1986-06-01), Herziger et al.
patent: 4618971 (1986-10-01), Weiss et al.
patent: 4626193 (1986-12-01), Gann
patent: 4633492 (1986-12-01), Weiss et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4751723 (1988-06-01), Gupta et al.
patent: 4752946 (1988-06-01), Gupta et al.
patent: 4774914 (1988-10-01), Ward
patent: 4837794 (1989-06-01), Riordan et al.
patent: 4891820 (1990-01-01), Rando et al.
patent: 4928020 (1990-05-01), Birx et al.
patent: 4959840 (1990-09-01), Akins et al.
patent: 5005180 (1991-04-01), Edelman et al.
patent: 5023884 (1991-06-01), Akins et al.
patent: 5023897 (1991-06-01), Neff et al.
patent: 5025445 (1991-06-01), Anderson et al.
patent: 5025446 (1991-06-01), Kuizenga
patent: 5027076 (1991-06-01), Horsley et al.
patent: 5070513 (1991-12-01), Letardi
patent: 5102776 (1992-04-01), Hammer et al.
patent: 5126638 (1992-06-01), Dethlefsen
patent: 5142166 (1992-08-01), Birx
patent: 5175755 (1992-12-01), Kumakhov
patent: 5189678 (1993-02-01), Ball et al.
patent: 5313481 (1994-05-01), Cook et al.
patent: 5315611 (1994-05-01), Ball et al.
patent: 5319695 (1994-06-01), Itoh et al.
patent: 5359620 (1994-10-01), Akins
patent: RE34806 (1994-12-01), Cann
patent: 5411224 (1995-05-01), Dearman et al.
patent: 5448580 (1995-09-01), Birx et al.
patent: 5471965 (1995-12-01), Kapich
patent: 5504795 (1996-04-01), McGeoch
patent: 5729562 (1998-03-01), Birx et al.
patent: 5763930 (1998-06-01), Partlo
patent: 5852621 (1998-12-01), Sandstrom
patent: 5856991 (1999-01-01), Ershov
patent: 5863017 (1999-01-01), Larson et al.
patent: 5866871 (1999-02-01), Birx
patent: 5936988 (1999-08-01), Partlo et al.
patent: 5953360 (1999-09-01), Vitruk et al.
patent: 5963616 (1999-10-01), Silfvast et al.
patent: 5978394 (1999-11-01), Newman et al.
patent: 5991324 (1999-11-01), Knowles et al.
patent: 6005879 (1999-12-01), Sandstrom et al.
patent: 6016325 (2000-01-01), Ness et al.
patent: 6018537 (2000-01-01), Hofmann et al.
patent: 6028880 (2000-02-01), Carlesi et al.
patent: 6031241 (2000-02-01), Silfvast et al.
patent: 6039850 (2000-03-01), Schulz
patent: 6051841 (2000-04-01), Partlo
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6067311 (2000-05-01), Morton et al.
patent: 6094448 (2000-07-01), Fomenkov et al.
patent: 6104735 (2000-08-01), Webb
patent: 6128323 (2000-10-01), Myers et al.
patent: 6151346 (2000-11-01), Partlo et al.
patent: 6151349 (2000-11-01), Gong et al.
patent: 6164116 (2000-12-01), Rice et al.
patent: 6172324 (2001-01-01), Birx
patent: 6192064 (2001-02-01), Algots et al.
patent: 6195272 (2001-02-01), Pascente
patent: 6208674 (2001-03-01), Webb et al.
patent: 6208675 (2001-03-01), Webb
patent: 6219368 (2001-04-01), Govorkov
patent: 6240117 (2001-05-01), Gong et al.
patent: 6285743 (2001-09-01), Kondo et al.
patent: 6304630 (2001-10-01), Bisschops et al.
patent: 6307913 (2001-10-01), Foster et al.
patent: 6359922 (2002-03-01), Partlo et al.
patent: 6370174 (2002-04-01), Onkels et al.
patent: 6377651 (2002-04-01), Richardson et al.
patent: 6381257 (2002-04-01), Ershov et al.
patent: 6392743 (2002-05-01), Zambon et al.
patent: 6396900 (2002-05-01), Barbee, Jr. et al.
patent: 6404784 (2002-06-01), Komine
patent: 6414979 (2002-07-01), Ujazdowski et al.
patent: 6442181 (2002-08-01), Oliver et al.
patent: 6449086 (2002-09-01), Singh
patent: 6452194 (2002-09-01), Bijkerk et al.
patent: 6452199 (2002-09-01), Partlo et al.
patent: 6466602 (2002-10-01), Fleurov et al.
patent: 6477193 (2002-11-01), Oliver et al.
patent: 6493374 (2002-12-01), Fomenkov et al.
patent: 6493423 (2002-12-01), Bisschops
patent: 6504903 (2003-01-01), Kondo et al.
patent: 6529531 (2003-03-01), Everage et al.
patent: 6532247 (2003-03-01), Spangler et al.
patent: 6535531 (2003-03-01), Smith et al.
patent: 6538257 (2003-03-01), Bgisschops
patent: 6538737 (2003-03-01), Sandstrom et al.
patent: 6541786 (2003-04-01), Partlo et al.
patent: 6549551 (2003-04-01), Ness et al.
patent: 6566667 (2003-05-01), Partlo et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6567450 (2003-05-01), Myers et al.
patent: 6576912 (2003-06-01), Visser et al.
patent: 6584132 (2003-06-01), Morton
patent: 6586757 (2003-07-01), Melnychuk et al.
patent: 6590922 (2003-07-01), Onkels et al.
patent: 6590959 (2003-07-01), Kandaka et al.
patent: 6618421 (2003-09-01), Das et al.
patent: 6621846 (2003-09-01), Sandstrom et al.
patent: 6625191 (2003-09-01), Knowles et al.
patent: 6647086 (2003-11-01), Amemiya et al.
patent: 6671294 (2003-12-01), Kroyan et al.
patent: 6721340 (2004-04-01), Fomenkov et al.
patent: 6744060 (2004-06-01), Ness et al.
patent: 6757316 (2004-06-01), Newman et al.
patent: 6782031 (2004-08-01), Hofmann et al.
patent: 6795474 (2004-09-01), Partlo et al.
patent: 6804327 (2004-10-01), Schriever et al.
patent: 6815700 (2004-11-01), Melnychuk et al.
patent: 6822251 (2004-11-01), Arenberg et al.
patent: 6865255 (2005-03-01), Richardson
patent: 6894298 (2005-05-01), Ahmad et al.
patent: 6904073 (2005-06-01), Yager et al.
patent: 6985508 (2006-01-01), Knowles
patent: 6987279 (2006-01-01), Hoshino et al.
patent: 02-105478 (1990-04-01), None
patent: 03-173189 (1991-07-01), None
patent: 06-053594 (1994-02-01), None
patent: 09-219555 (1997-08-01), None
patent: 2000-058944 (2000-02-01), None
patent: 200091096 (2000-03-01), None
patent: WO2004/010470 (2004-12-01), None
Andreev et al., “Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography,” Proc. of SPIE 5196:128-136 (2004).
Apruzese, “X-ray laser reearch using z pinches,” Am. Inst. Of Phys. 399-403 (1994).
Bollanti et al., “Compact three electrodes excimer laser IANUS for a POPA optical system,” SPIE Proc. (2206) 144-153 (1994).
Bollanti et al., “Ianus the three-electrode excimer laser,” App. Phys. B (Lasers & Optics) 66(4):401-406, (1998).
Braun et al., “Multi-component EUV multiplayer Mirrors,” Proc. SPIE, 5037:2-13 (2003).
Choi et al., “A 1013A/s high energy density micro discharge radiation source,” B. Radiation Characteristics, p. 287-290.
Choi et al., “Fast pulsed hollow cathode capillary discharge device,” Rev. of Sci. Instrum. 69(9):3118-3122 (1998).
Cho
Bowering Norbert
Ershov Alexander I.
Fomenkov Igor V.
Hansson Bjorn A. M.
Khodykin Oleh
Cymer Inc.
Hillman Matthew K.
Vanore David A
LandOfFree
Systems and methods for reducing the influence of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Systems and methods for reducing the influence of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Systems and methods for reducing the influence of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4250758