Systems and methods for providing illumination of a specimen...

Details Systems and methods for providing illumination of a specimen... Systems and methods for providing illumination of a specimen...

2007-12-04

2007-12-04

Rosenberger, Richard A. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C362S259000

Reexamination Certificate

active

11219014

ABSTRACT:
Systems and methods for providing illumination of a specimen for inspection are provided. One system includes one or more first optical elements configured to illuminate a diffuser with a predetermined pattern of coherent light. The system also includes one or more second optical elements configured to image light exiting the diffuser onto an illumination pupil of the system such that the predetermined pattern is reproduced in the illumination pupil. In addition, the system includes an objective lens configured to focus light from the predetermined pattern in the illumination pupil onto a specimen plane. In one embodiment, the light focused onto the specimen plane is not substantially coherent. In another embodiment, the predetermined pattern is selected based on an illumination mode selected for the inspection of the specimen.

REFERENCES:
patent: 6672739 (2004-01-01), Argyle et al.
patent: 7001055 (2006-02-01), Lange
U.S. Appl. No. 11/228,584 entitled Fourier Filters and Wafer Inspection Systems.

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