Systems and methods for minimizing scattered light in...

Optical: systems and elements – Optical modulator

Reexamination Certificate

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C359S738000, C359S259000, C359S290000, C430S326000

Reexamination Certificate

active

07859735

ABSTRACT:
A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.

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