Optical: systems and elements – Optical modulator
Reexamination Certificate
2009-07-09
2010-12-28
Stultz, Jessica T (Department: 2873)
Optical: systems and elements
Optical modulator
C359S738000, C359S259000, C359S290000, C430S326000
Reexamination Certificate
active
07859735
ABSTRACT:
A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.
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Cebuhar Wenceslao A.
Hintersteiner Jason D.
Janik Stan
Vladimirsky Yuli
ASML Holding N.V.
Sterne Kessler Goldstein & Fox P.L.L.C.
Stultz Jessica T
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