Optics: measuring and testing – Dimension
Reexamination Certificate
2007-09-25
2007-09-25
Rosenberger, Richard A. (Department: 2877)
Optics: measuring and testing
Dimension
C356S237500, C382S145000
Reexamination Certificate
active
11012005
ABSTRACT:
A system and method of measuring a distance of semiconductor patterns is provided. The system includes a microscope and a control unit. The control unit calculates standard coordinates of standard points in view-fields that include spots, spot coordinates of spots with respect to standard points, real coordinates of spots from both of the standard coordinates and spot coordinates, and finally the distance between the two spots from the first and second real coordinates. Coordinates are determined using high magnification, in conjunction with pixel counting, allowing more precise distance measurements.
REFERENCES:
patent: 6481003 (2002-11-01), Maeda
Choi Sun-Yong
Jun Chung-Sam
Park Dong-Jin
Shin Koung-Su
Yoon Kwang-Jun
Marger & Johnson & McCollom, P.C.
Rosenberger Richard A.
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