Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Reexamination Certificate
2007-11-06
2007-11-06
Kunemund, Robert (Department: 1722)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
C117S033000, C117S034000, C117S213000, C117S217000
Reexamination Certificate
active
10930654
ABSTRACT:
The invention is directed to apparatus and methods for measuring and for reducing dust in granular polysilicon. In one aspect, a system includes a process vessel having a vacuum port for pulling dust from the polysilicon. Another system of the invention includes a baffle tube for receiving a polysilicon flow. A measuring system includes a manifold and filter for separating and measuring the dust from a flow of polysilicon. The invention is also directed to methods of using the systems, to methods of manufacturing and packaging granular polysilicon, and to a supply of granular polysilicon.
REFERENCES:
patent: 3998686 (1976-12-01), Meiling et al.
patent: 4710260 (1987-12-01), Witter et al.
patent: 5242531 (1993-09-01), Klingshirn et al.
patent: RE35242 (1996-05-01), Kajimoto et al.
patent: 5588993 (1996-12-01), Holder
patent: 5855232 (1999-01-01), Oda et al.
patent: 5919303 (1999-07-01), Holder
patent: 6062094 (2000-05-01), Carlini et al.
patent: 6231669 (2001-05-01), Altekruger et al.
patent: 6285730 (2001-09-01), Barnes
patent: 6609870 (2003-08-01), Williams et al.
patent: 2003/0077128 (2003-04-01), Williams et al.
patent: 36 43 378 (1988-06-01), None
patent: 01-065010 (1989-03-01), None
patent: 06-191817 (1994-07-01), None
patent: WO 01/84116 (2001-11-01), None
patent: 02/094714 (2002-11-01), None
International Search Report. PCT/US2005/016527, dated Jun. 20, 2006.
Hanby, I., Dust Monitoring Equipment web page, http://web.archive.org/web/20040221061040/http://www.btinternet.com/˜ian.hanby/index.html, 2 pages, admitted prior art, no date.
Hokori Sensors and Comprehensive Dust Monitoring Systems web page, http://web.archive.org/web/20020723021635/http://www.kosinsha.co.jp/english/dustsensor/dustsensor.html, 1 page, admitted prior art, no date.
Multisizer™ 3 Coulter Counter® web page, http://www.coulter.com/products/instrument/partChar/pc—multisizer3.asp, 4 pages, admitted prior art, no date.
Product Range web page, http://www.landinst.com/comb/products/products.html, 2 pages, admitted prior art, no date.
Perry, R.H.,Perry's Chemical Engineers' Handbook Sixth Edition, 1984, pp. 5-63 through 5-68 and 20-78 through 20-80, McGraw-Hill, Inc., no date.
Hilker John D.
Holder John D.
Sreedharamurthy Hariprasad
Kunemund Robert
MEMC Electronic Materials , Inc.
Senniger Powers
LandOfFree
Systems and methods for measuring and reducing dust in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Systems and methods for measuring and reducing dust in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Systems and methods for measuring and reducing dust in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3837406