Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2008-05-13
2008-05-13
Pham, Hoa Q. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237500
Reexamination Certificate
active
11302936
ABSTRACT:
Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The system also includes a gas flow subsystem configured to replace a gas located proximate to the spot on the wafer with a medium that scatters less of the light than the gas thereby increasing the sensitivity of the system. In addition, the system includes a processor configured to detect defects on the wafer using the output signals.
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Haller Kurt L.
Shortt David
Wolters Christian
Baker & McKenzie LLP
KLA-Tencor Technologies Corp.
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