Systems and methods for inspecting a wafer with increased...

Details Systems and methods for inspecting a wafer with increased... Systems and methods for inspecting a wafer with increased...

2008-05-13

2008-05-13

Pham, Hoa Q. (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500

Reexamination Certificate

active

07372559

ABSTRACT:
Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The system also includes a gas flow subsystem configured to replace a gas located proximate to the spot on the wafer with a medium that scatters less of the light than the gas thereby increasing the sensitivity of the system. In addition, the system includes a processor configured to detect defects on the wafer using the output signals.

REFERENCES:
patent: 3626141 (1971-12-01), Daly
patent: 5270781 (1993-12-01), Singh et al.
patent: 5574276 (1996-11-01), Ishimaru
patent: 6005660 (1999-12-01), Yoshida et al.
patent: 6201601 (2001-03-01), Vaez-Iravani et al.
patent: 6271916 (2001-08-01), Marxer et al.
patent: 6356653 (2002-03-01), Brigante et al.
patent: 6538730 (2003-03-01), Vaez-Iravani et al.
patent: 6555815 (2003-04-01), Feuerbaum et al.
patent: 7277171 (2007-10-01), Johs et al.
Miles et al., “Laser Rayleigh scattering,” Measurement Science & Technology, vol. 12, 2001, pp. R33-R51.
Stone et al., “Using helium as a standard of refractive index: correcting errors in a gas refractometer,” Metrologia, vol. 41, 2004, pp. 189-197.
Pendrill, “Macroscopic and microscopic polarizabilities of helium gas,” J. Phys. B: At. Mol. Opt. Phys., vol. 29, 1996, pp. 3581-3586.
Chan et al., “The refractive index of helium,” Proc. Phys. Soc., 1965, vol. 85, pp. 227-230.
Sun et al., “Effects of Gas Medium on Femtosecond Laser Beam Delivery,” presented at 21st International Congress on Applications of Lasers & Electro-Optics (ICALEO), Oct. 2002, 10 pages.
Sun et al., “Inert gas beam delivery for ultrafast laser micromachining at ambient pressure,” Journal of Applied Physics, vol. 89, No. 12, Jun. 2001, pp. 8219-8224.
Sun et al, “Novel Beam Delivery Technique for Ultrafast Laser Processing,” Thermal Science & Engineering, vol. 7, No. 6, 1999, pp. 81-85.

Affiliated with

Also associated with

Rating

Systems and methods for inspecting a wafer with increased... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Systems and methods for inspecting a wafer with increased..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Systems and methods for inspecting a wafer with increased... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2756067