Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-09-01
2011-10-04
Huff, Mark F (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S030000, C430S022000
Reexamination Certificate
active
08029947
ABSTRACT:
Methods, systems, and tool sets involving reticles and photolithography processing. Several embodiments of the invention are directed toward obtaining qualitative data from within the pattern area of a reticle that is indicative of the physical characteristics of the pattern area. Additional embodiments of the invention are directed toward obtaining qualitative data indicative of the physical characteristics of the reticle remotely from a photolithography tool. These two aspects of the invention can be combined in further embodiments in which qualitative data is obtained from within the pattern area of a reticle in a tool that is located remotely from the photolithography tool. As a result, several embodiments of methods and systems in accordance with the invention provide data taken from within the pattern area to more accurately reflect the contour of the pattern area of the reticle without using the photolithography tool to obtain such measurements. This is expected to provide more accurate data for correcting the photolithography tool to compensate for variances in the pattern area, and it is expected to increase throughput because the photolithography tool is not taken away from processing production wafers to measure the reticle.
REFERENCES:
patent: 4719705 (1988-01-01), Laganza et al.
patent: 5586058 (1996-12-01), Aloni et al.
patent: 5868560 (1999-02-01), Tamada et al.
patent: 6071656 (2000-06-01), Lin
patent: 6360005 (2002-03-01), Aloni et al.
patent: 6532056 (2003-03-01), Osakabe et al.
patent: 6635872 (2003-10-01), Davidson
patent: 6704091 (2004-03-01), Moriyama
patent: 6727565 (2004-04-01), Itoh
patent: 6734950 (2004-05-01), Nakano
patent: 6765673 (2004-07-01), Higashikawa
patent: 2003/0076989 (2003-04-01), Maayah et al.
patent: 2004/0057030 (2004-03-01), Okubo et al.
patent: 2004/0165164 (2004-08-01), Raebiger et al.
Huff Mark F
Jelsma Jonathan
Micro)n Technology, Inc.
Perkins Coie LLP
LandOfFree
Systems and methods for implementing and manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Systems and methods for implementing and manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Systems and methods for implementing and manufacturing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4255600