Systems and methods for filling voids and improving...

Details Systems and methods for filling voids and improving... Systems and methods for filling voids and improving...

2007-04-10

2007-04-10

McNeil, Jennifer (Department: 1775)

Glass manufacturing

Processes

Sol-gel or liquid phase route utilized

C264S042000, C264S046400, C264S048000, C264S621000, C427S096100, C427S096200, C427S096700, C427S097300, C427S098200, C427S098400, C427S098800, C065S040000

Reexamination Certificate

active

11154629

ABSTRACT:
Methods of reducing the intrusions or migrations of photolithography materials by introducing a sol-gel layer onto a porous thin film prior to applying the photolithography/photoresist material layer. Curing the sol-gel layer results in the sol-gel layer merging or unifying with the underlying porous thin film layer so that the combined sol-gel/thin layer exhibits substantially the same properties as the untreated porous thin film layer before the sol-gel was applied. As a result, a greater etching accuracy is achieved.

REFERENCES:
patent: 3865469 (1975-02-01), Asai et al.
patent: 5202274 (1993-04-01), Bae et al.
patent: 5413865 (1995-05-01), Nakamura et al.
patent: 5688606 (1997-11-01), Mahulikar et al.
patent: 5733660 (1998-03-01), Makita et al.
patent: 5807611 (1998-09-01), Bearinger et al.
patent: 5925228 (1999-07-01), Panitz et al.

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