Systems and methods for disinfection

Details Systems and methods for disinfection Systems and methods for disinfection

2008-09-25

2011-12-20

Joyner, Kevin (Department: 1775)

Liquid purification or separation

Processes

Utilizing electrical or wave energy directly applied to...

C210S748010, C210S748100, C422S022000, C422S024000

Reexamination Certificate

active

08080165

ABSTRACT:
Methods and systems for establishing Taylor-Couette flow in a fluid are provided. Aspects of the disclosed methods and systems incorporate laminar Taylor-Couette flow in combination with a source of radiation to provide more uniform radiation exposure to the fluid and its components. Common problems of non-uniform radiation levels and concentration boundary layer effects in UV reactors are largely eliminated using the methods and devices provided herein. In an exemplary embodiment, the reactor of the present disclosure has a hollow outer cylinder or stator and a rotor positioned therein and smooth walls for both the outer wall of its rotor and the inner wall of the outer cylinder or stator in which the rotor is positioned, the space between which forming the annular fluid gap.

REFERENCES:
patent: 4963750 (1990-10-01), Wilson
patent: 5993674 (1999-11-01), Rolchigo et al.
patent: 6471392 (2002-10-01), Holl et al.
patent: 6576201 (2003-06-01), Woo et al.
patent: 2006/0054549 (2006-03-01), Schoendorfer
U.S. Appl. No. 60/384,559, Schoendorfer, D. W., May 30, 2002.
Walkenstrom, P. et al., “Effects of flow behaviour on the aggregation of whey protein suspensions, pure or mixed with xanthan”, Journal of Food Engineering, 42(1999) 15-26.

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